Extended-Range In-Situ SEM PicoIndenter

Bruker Hysitron PI 89

Product Overview

The Hysitron® PI 89 SEM PicoIndenter is a powerful, modular in-situ nanomechanical test instrument designed for use within scanning electron microscopes (SEM or FIB/SEM). Leveraging Bruker’s industry-leading capacitive transducer technology, the PI 89 enables real-time mechanical testing with high spatial resolution under SEM imaging conditions.

Its compact, high-stiffness design allows for seamless integration into SEM systems without compromising imaging capabilities. The PI 89 supports a wide range of test types—nanoindentation, compression, tension, bending, fatigue, and wear—with options for high-temperature, cryogenic, electrical, and XPM accelerated property mapping modes. The PI 89 Auto variant further enhances productivity through automation and seamless imaging integration.

 

Key Features

  • Wide Force and Displacement Range: Transducer options up to 3.5 N force and 150 µm displacement
  • In-Situ Testing Compatibility: Real-time observation of deformation, fracture, fatigue, and phase transformations
  • Modular & Upgradeable: Supports high-temp (up to 1000°C), cryo (< -130°C), electrical, and fatigue testing
  • Exclusive Bruker Transducers: Load and displacement-controlled tests with low noise and high accuracy
  • SEM/FIB Ready: Minimal footprint, low working distance, and full stage tilt compatibility
  • Rotational/Tilt Stage: Optional 5-axis stage for EBSD, TKD, and co-localized imaging integration
  • High-Speed Data Acquisition: Up to 39 kHz with 78 kHz feedback rate using Performech® II controller
  • Push-to-Pull and Direct Pull Testing: For tensile property measurements of nanowires, films, and micro-pillars
  • XPM Accelerated Property Mapping: Up to one indentation per second for rapid modulus/hardness maps

 

Specifications

Specification Details
Max Force (Transducer Options) 10 mN, 0.5 N, >3.5 N
Force Noise Floor (In SEM) <0.4 μN (10 mN), <5 μN (0.5 N), 30 μN (3.5 N)
Force Noise Floor (Ideal Env.) <50 nN (10 mN transducer)
Max Displacement 5 µm, 30 µm, 150 µm
Displacement Noise (SEM) <1 nm
Displacement Noise (Ideal Env.) <0.1 nm (10 mN transducer)
Machine Stiffness 0.9 × 10⁶ N/m
Positioning Range (XYZ) 12 mm × 26 mm × 29 mm; 1 nm encoded resolution
System Size (WxHxL) 68 × 42 × 191 mm
System Weight 550 g
Rotation/Tilt Stage 5 Degrees of Freedom (PI 89 Auto)
XPM Mapping Capability Automated large area maps >1 mm², 1 test/sec
Optional Testing Modes Nanoindentation, fatigue, wear, SPM, nanoScratch, nanoDMA, electrical
Temperature Range Cryo < -130°C to 1000°C (with environmental stages)
SEM Compatibility SEM, FIB/SEM, TKD, STEM compatible

 

 

Applications

Semiconductor & Electronics

  • Mechanical property analysis of ultra-thin films, interconnects, and packaging materials
  • Real-time deformation of advanced microstructures under vacuum and imaging conditions
  • Co-localized EBSD/mechanical property mapping for process monitoring

Materials Science & Metallurgy

  • Pillar compression and fracture studies
  • Accelerated hardness/mapping of multiphase materials
  • Fatigue, creep, and stress–strain analysis in 3D printed metals and ceramics

Nanotechnology & MEMS

  • In-situ performance of MEMS actuators and sensors under stress
  • Tensile tests on nanowires, films, and microbeams using push-to-pull devices
  • Ultra-low force precision testing for sub-micron structures
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